Dependence of exchange bias and coercive field on Cu spacer thickness in oblique deposited Co/Cu/CoO multilayers

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dc.authoridKOCAMAN, BAYRAM/0000-0002-9439-3604
dc.contributor.authorKocaman, Bayram
dc.contributor.authorAktas, Kubra Yildiz
dc.contributor.authorBasaran, Ali C.
dc.date.accessioned2024-12-24T19:27:27Z
dc.date.available2024-12-24T19:27:27Z
dc.date.issued2021
dc.departmentSiirt Üniversitesi
dc.description.abstractEffect of growth-induced uniaxial anisotropy and thickness of non-magnetic Cu spacer between the ferromagnetic/antiferromagnetic Co/CoO multilayers on the exchange bias, coercive field, and magnetic anisotropy have been studied in 10?300 K temperature range. Co(8 nm)/Cu(tCu)/CoO(4 nm) (tCu = 0.6?2.6 nm) multilayers on Si (100) substrates were prepared using the oblique-angle magnetron sputtering deposition to induce growth induced magnetic anisotropy. The top Co layer was allowed to be naturally oxidized to obtain antiferromagnetic CoO. The films show a strong uniaxial in-plane anisotropy determined by ferromagnetic resonance measurements. Magnetization measurements for both easy and hard magnetization directions revealed that the exchange bias and coercive fields decrease by increasing Cu thickness. The existence of strong exchange bias across the thickest Cu layer shows the long-range character of exchange and dipolar interactions at 10 K. Dependence of Cu spacer thickness shows an oscillatory behavior that can be ascribed to the competitions between Ruderman?Kittel?Kasuya?Yosida (RKKY) and dipolar interactions.
dc.description.sponsorshipScientific and Technological Research Council of Turkey [114F359]
dc.description.sponsorshipWe thank B. Aktas for fruitful discussions and critical reading of the manuscript. We thank L. C. Arslan and M. Ertas for their help at the initial stage of this work. This work was partially supported by The Scientific and Technological Research Council of Turkey, Grant No 114F359. The research work was carried out by Ali C. Basaran at Gebze Technical University, but the author is not affiliated with the university at the time of publication.
dc.identifier.doi10.1016/j.jmmm.2021.167926
dc.identifier.issn0304-8853
dc.identifier.issn1873-4766
dc.identifier.scopus2-s2.0-85104979333
dc.identifier.scopusqualityQ2
dc.identifier.urihttps://doi.org/10.1016/j.jmmm.2021.167926
dc.identifier.urihttps://hdl.handle.net/20.500.12604/6629
dc.identifier.volume530
dc.identifier.wosWOS:000643888500002
dc.identifier.wosqualityQ3
dc.indekslendigikaynakWeb of Science
dc.indekslendigikaynakScopus
dc.language.isoen
dc.publisherElsevier
dc.relation.ispartofJournal of Magnetism and Magnetic Materials
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı
dc.rightsinfo:eu-repo/semantics/closedAccess
dc.snmzKA_20241222
dc.subjectGrowth-induced magnetic anisotropy
dc.subjectExchange bias
dc.subjectLong-range order
dc.subjectCo
dc.subjectCu
dc.subjectCoO thin films
dc.titleDependence of exchange bias and coercive field on Cu spacer thickness in oblique deposited Co/Cu/CoO multilayers
dc.typeArticle

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